Interference lithography (IL) is a pattern definition technique which can define micrometer and sub-micrometer large are......

A large area exposure technology with high-resolution nanostructure using broadband soft X-ray interference lithography(......

This paper introduces the recent progress in methodologies and their related applications based on the soft x-ray interf......

考虑到实际入射光强的空间分布不均匀,基于Kretschmann模型并采用角谱方法分析模拟了两束高斯光干涉诱导表面等离子激元（SPP）驻波场......

基于严格的矢量耦合波方法，结合纳米级光栅实际制作工艺，定量分析了在13．4nm软X射线（TE偏振）正入射条件下，光栅材料、厚度、占空比、梯形......